JPH0469408B2 - - Google Patents

Info

Publication number
JPH0469408B2
JPH0469408B2 JP59130434A JP13043484A JPH0469408B2 JP H0469408 B2 JPH0469408 B2 JP H0469408B2 JP 59130434 A JP59130434 A JP 59130434A JP 13043484 A JP13043484 A JP 13043484A JP H0469408 B2 JPH0469408 B2 JP H0469408B2
Authority
JP
Japan
Prior art keywords
wafer
stage
exposure
chip
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59130434A
Other languages
English (en)
Japanese (ja)
Other versions
JPS618923A (ja
Inventor
Tatsuro Kawabata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59130434A priority Critical patent/JPS618923A/ja
Publication of JPS618923A publication Critical patent/JPS618923A/ja
Publication of JPH0469408B2 publication Critical patent/JPH0469408B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59130434A 1984-06-25 1984-06-25 露光装置 Granted JPS618923A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59130434A JPS618923A (ja) 1984-06-25 1984-06-25 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59130434A JPS618923A (ja) 1984-06-25 1984-06-25 露光装置

Publications (2)

Publication Number Publication Date
JPS618923A JPS618923A (ja) 1986-01-16
JPH0469408B2 true JPH0469408B2 (en]) 1992-11-06

Family

ID=15034142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59130434A Granted JPS618923A (ja) 1984-06-25 1984-06-25 露光装置

Country Status (1)

Country Link
JP (1) JPS618923A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0628224B2 (ja) * 1985-10-29 1994-04-13 キヤノン株式会社 露光方法および装置
JPH04105069U (ja) * 1991-02-18 1992-09-10 株式会社東芝 エレベータ
JP2559470Y2 (ja) * 1991-05-13 1998-01-19 フジテック株式会社 エレベータかご室の芳香装置

Also Published As

Publication number Publication date
JPS618923A (ja) 1986-01-16

Similar Documents

Publication Publication Date Title
JP3402750B2 (ja) 位置合わせ方法及びそれを用いた素子の製造方法
EP1039511A1 (en) Projection exposure method and projection aligner
JP3356047B2 (ja) ウエハ周辺露光装置
JPH088177A (ja) 投影露光装置及びそれを用いたデバイスの製造方法
JPH0729803A (ja) 走査型露光装置及び該装置を用いてデバイスを製造する方法
US6757049B2 (en) Apparatus and method for exposure
JPH0469408B2 (en])
JPH03235319A (ja) 拡大投影露光方法及びその装置
JPH07297117A (ja) 投影露光装置及びそれを用いた半導体デバイスの製造方法
JP3576722B2 (ja) 走査型露光装置及びそれを用いたデバイス製造方法
JP3722330B2 (ja) 露光装置およびデバイス製造方法
JPH0154854B2 (en])
JP2647835B2 (ja) ウェハーの露光方法
JP3089798B2 (ja) 位置合わせ装置
JPH08339959A (ja) 位置合わせ方法
JPH1152545A (ja) レチクルおよびそれによって転写されたパターンならびにレチクルと半導体ウエハとの位置合わせ方法
JP3383166B2 (ja) 周辺露光装置
KR100724623B1 (ko) 노광장비내에서의 웨이퍼엣지 노광방법
JPS6246522A (ja) 高速アライメント露光方法
JPS63275115A (ja) 半導体装置のパタ−ン形成方法
JP2580572B2 (ja) 投影露光装置
JPS6097623A (ja) 露光装置
JP2987899B2 (ja) 位置合わせ方法
JP2004134476A (ja) 露光装置、アライメント方法および半導体装置の製造方法
JPH0584664B2 (en])